LITHOGRAPHIC APPARATUS, IMMERSION PROJECTION APPARATUS AND DEVICE MANUFACTURING METHOD

• Main Authors: VAN DER TOORN JAN GERARD CORNELIS, VAN DER MEULEN FRITS, CUPERUS MINNE, HOUKES MARTIJN, BUTLER HANS, FRENCKEN MARK JOHANNES HERMANUS, ARENDS ANTONIUS HENRICUS, COX HENRIKUS HERMAN MARIE, DRAAIJER EVERT HENDRIK JAN, TEN KATE NICOLAAS
• Format: Patent
• Language: English
• Published: 09.10.2006
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

A lithographic apparatus comprises a substrate table (WT) to hold a substrate (W) and a projection system (PS) to project a patterned radiation beam onto a target portion of the substrate. The lithographic apparatus further comprises a fluid supply system (LS) to supply a fluid between the substrate and a final lens element of the projection system as well as a position controller (CON L ) to control a position of the fluid supply system. The position controller is configured to, being provided with a position quantity of the substrate, determine a desired position of the liquid supply system by adding a position offset (PO) to the position quantity of the substrate, and position the liquid supply system according to the desired position. The position quantity may comprise a position and/or rotational position of the substrate table and/or a height function of a substrate height.