CLEANING COMPOSITION FOR SEMICONDUCTOR CONTAINING UNSATURATED DICARBOXYLIC ACID AND ETHYLENE UREA AND CLEANING METHOD

• Main Authors: KOBAYASHI ICHIRO, FUJITA YOICHIRO, MIYAZAWA TOMOE
• Format: Patent
• Language: English
• Published: 05.09.2006
• Subjects: ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES; APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CANDLES; CHEMICAL SURFACE TREATMENT; CHEMISTRY; CINEMATOGRAPHY; CLEANING OR DEGREASING OF METALLIC MATERIAL BY CHEMICALMETHODS OTHER THAN ELECTROLYSIS; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DETERGENT COMPOSITIONS; DETERGENTS; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; FATTY ACIDS THEREFROM; HOLOGRAPHY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; MATERIALS THEREFOR; METALLURGY; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; RECOVERY OF GLYCEROL; RESIN SOAPS; SEMICONDUCTOR DEVICES; SOAP OR SOAP-MAKING; USE OF SINGLE SUBSTANCES AS DETERGENTS

[PROBLEMS] Disclosed are a cleaning composition for semiconductors containing an unsaturated dicarboxylic acid and an ethylene urea, and a cleaning method. [MEANS FOR SOLVING PROBLEMS] Disclosed is a composition for cleaning residue in a semiconductor wafer processing step which contains an unsaturated dicarboxylic acid and an ethylene urea as essential components. Among unsaturated dicarboxylic acids, maleic acids are particularly preferable. A preferred cleaning composition contains an unsaturated dicarboxylic acid, an ethylene urea, at least one organic carboxylic acid other than unsaturated dicarboxylic acid, at least one basic compound other than ethylene urea, and water. This preferred composition may further include, as an optional component, at least one material selected from the group consisting of organic solvents, chelating agents, surfactants and phosphoric acids and/or phosphinic acids.