CATHODE ARRANGEMENT FOR SPUTTERING A ROTATABLE TARGET PIPE

• Main Authors: KAWAKAMI KEN, MARQUARDT DIETMAR, SAUER ANDREAS, TRUBE SCOTT, RISO TOM, NEWCOMB RICHARD
• Format: Patent
• Language: English
• Published: 19.05.2006
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

The assembly has a support shaft for tubular target arranged in a support construction. A detachable coupling arrangement is provided between the shaft and target for replacement of the target. A coaxial spacer and two separation points (32) are arranged between the shaft and target. The separation points produce a torque proof and rigid connection between the shaft and spacer, and a detachable connection between the spacer and target.