LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
A lithographic projection apparatus is disclosed. The apparatus includes an illumination system (IL) configured to condition a beam of radiation (PB), and a support structure (MT) configured to support a patterning device (MA). The patterning device serves to impart the beam of radiation with a patt...
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Main Authors | , , , , , , |
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Format | Patent |
Language | English |
Published |
18.05.2006
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Subjects | |
Online Access | Get full text |
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Summary: | A lithographic projection apparatus is disclosed. The apparatus includes an illumination system (IL) configured to condition a beam of radiation (PB), and a support structure (MT) configured to support a patterning device (MA). The patterning device serves to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate table (WT) configured to hold a substrate (W), a projection system (PL) configured to project the patterned beam onto a target portion of the substrate, and a fluid supply system (10) configured to provide a fluid to a volume. The volume includes at least a portion of the projection system and/or at least a portion of the illumination system. The apparatus further includes a coupling device (12,14,16,18) configured to couple the fluid supply system to the substrate table, substrate, support structure, patterning device, or any combination thereof. |
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Bibliography: | Application Number: KR20050054233 |