SHALLOW TRENCH ISOLATION PROCESS

A structure including a transistor and a trench structure, with the trench structure inducing only a portion of the strain in a channel region of the transistor.

Saved in:
Bibliographic Details
Main Authors CURRIE MATHEW T, LOCHTEFELD ANTHONY J
Format Patent
LanguageEnglish
Published 08.12.2005
Edition7
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
Online AccessGet full text

Cover

More Information
Summary:A structure including a transistor and a trench structure, with the trench structure inducing only a portion of the strain in a channel region of the transistor.
Bibliography:Application Number: KR20057016595