MASK PROCESSING DEVICE, MASK PROCESSING METHOD, PROGRAM, AND MASK

An alignment mark is produced based on design data (151) and mask characteristic data (152) showing at least the characteristics of a complementary stencil mask, a membrane shape is designed, PUF dividing and boundary processing are performed, a complementary division is effected, joining is made, a...

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Bibliographic Details
Main Authors ASHIDA ISAO, NAKAYAMA KOHICHI
Format Patent
LanguageEnglish
Published 10.10.2005
Edition7
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:An alignment mark is produced based on design data (151) and mask characteristic data (152) showing at least the characteristics of a complementary stencil mask, a membrane shape is designed, PUF dividing and boundary processing are performed, a complementary division is effected, joining is made, a complementary pattern disposition processing is performed, a pattern shape is verified, an in-membrane correction is made, a mask configuration is effected, an exposure verification is made, a mask reversion/ correction is performed, a correction result is verified, and a data conversion processing is performed to thereby generate drawn membrane data and drawn pattern data.
Bibliography:Application Number: KR20057014471