PLASMA ETCHING METHOD FOR OBTAINING HIGH SELECTIVITY IN USING LOW PLASMA SOURCE POWER

Saved in:
Bibliographic Details
Main Authors KIM, NAM HEON, SONG, YEONG SU, OH, SANG RYONG, KIM, SHEUNG KI
Format Patent
LanguageEnglish
Published 27.06.2005
Edition7
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
Online AccessGet full text

Cover

More Information
Bibliography:Application Number: KR20030094413