RF POWER SUPPLY APPARATUS FOR GENERATING UNIFORM PLASMA

• Main Authors: HAN, SUN SEOK, KIM, MYOUNG SOO
• Format: Patent
• Language: English; Korean
• Published: 22.02.2005
• Edition: 7
• Subjects: DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL ANALOGUE/DIGITAL CONVERTERS; OPTICAL LOGIC ELEMENTS; OPTICS; PHYSICS; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF

PURPOSE: An RF power supply apparatus for generating uniform plasma is provided to generate uniform and stabilized plasma required for manufacturing a large LCD(Liquid Crystal Display) panel by supplying RF power symmetrically and stably. CONSTITUTION: An RF power supply apparatus includes an RF oscillator(120), a plasma electrode(50), and a plurality of impedance matching devices(210,220) connected in parallel with the RF oscillator. Each of the plurality of impedance matching devices includes an input port connected to the RF oscillator and an output port connected to the plasma electrode. The impedance matching devices are located above the plasma electrode symmetrically. One end of a gas supply pipe(60) for supplying reaction gases is connected to the center of the plasma electrode. The impedance matching devices are connected to the gas supply pipe using a clamp line(300) surrounding the gas supply pipe.