APPARATUS AND METHOD FOR INSPECTING DEFECTS CAPABLE OF IMPROVING ACCURACY IN DEFECT INSPECTION AND REDUCING INSPECTION TIME

• Main Authors: JUN, CHUNG SAM, KIM, JOUNG SOO, KIM, MOON KYUNG, YANG, YU SIN, CHOI, SUN YONG, CHON, SANG MUN
• Format: Patent
• Language: English; Korean
• Published: 21.02.2005
• Edition: 7
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES; MEASURING; PHYSICS; SEMICONDUCTOR DEVICES; TESTING

PURPOSE: An apparatus and a method for inspecting defects are provided to improve accuracy in defect inspection and reduce inspection time by calculating an optimal amplification ratio based on regional characteristics on an object to be inspected. CONSTITUTION: An apparatus for inspecting defects i...