APPARATUS AND METHOD FOR INSPECTING DEFECTS CAPABLE OF IMPROVING ACCURACY IN DEFECT INSPECTION AND REDUCING INSPECTION TIME
PURPOSE: An apparatus and a method for inspecting defects are provided to improve accuracy in defect inspection and reduce inspection time by calculating an optimal amplification ratio based on regional characteristics on an object to be inspected. CONSTITUTION: An apparatus for inspecting defects i...
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Main Authors | , , , , , |
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Format | Patent |
Language | English Korean |
Published |
21.02.2005
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Edition | 7 |
Subjects | |
Online Access | Get full text |
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Summary: | PURPOSE: An apparatus and a method for inspecting defects are provided to improve accuracy in defect inspection and reduce inspection time by calculating an optimal amplification ratio based on regional characteristics on an object to be inspected. CONSTITUTION: An apparatus for inspecting defects includes a stage(140), a light emitter(110), a detector(130), a controller(160), and a determiner(170). The stage supports and transfers an object to be inspected. The light emitter is apart from the stage by a predetermined distance and sequentially illuminates a light to at least two regions on the object to be inspected. The detector collects the light reflected from the object to be inspected and amplifies the collected light by an amplification ratio. The controller varies the amplification ratio according to regional characteristics corresponding to a variance of the amplified light. The determiner analyzes the amplified light and determines an error on the object to be inspected. |
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Bibliography: | Application Number: KR20030053537 |