LITHOGRAPHIC APPARATUS AND METHOD FOR FABRICATING DEVICE TO ELIMINATE NECESSITY OF GAS SUPPLY

• Main Authors: DONDERS, SJOERD NICOLAAS LAMBERTUS, LOOPSTRA, ERIK ROELOF, KOLESNYCHENKO, ALEKSEY YURIEVICH, HOOGENDAM, CHRISTIAAN ALEXANDER, COX, HENRIKUS HERMAN MARIE, VANSANTEN, HELMAR
• Format: Patent
• Language: English; Korean
• Published: 06.01.2005
• Edition: 7
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

PURPOSE: A lithographic apparatus is provided to eliminate the necessity of a gas supply and prevent bubbles from being formed in liquid by supplying an effective sealing part for containing liquid to a space between the surface of an imaged substrate and the final element of a projection system. CONSTITUTION: A radiation system supplies a projection beam of radiation. A support structure supports a patterning unit functioning to pattern the projection beam according to a desired pattern. A substrate(W) is held by a substrate table. A liquid supply system supplies liquid to a space(2) between the final element of a projection system(PL) and the substrate, including a sealing member(4) and a liquid sealing unit. The sealing member extends along at least a part of the interface of the space between the final element of the projection system and the substrate. The liquid sealing unit forms a sealing part between the sealing member and the surface of the substrate by a flow of liquid.