EXHAUST SYSTEM FOR MINIMIZING VOLUME OF PROCESS CHAMBER OF CVD EQUIPMENT

PURPOSE: An exhaust system for minimizing a volume of a process chamber of CVD equipment is provided to improve uniformity of a fabrication process and reduce powders stacked on an inside of an exhaust manifold by obtaining uniform exhaust pressure. CONSTITUTION: A plurality of exhaust holes(15) are...

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Bibliographic Details
Main Author JANG, GEUN HA
Format Patent
LanguageEnglish
Korean
Published 10.12.2004
Edition7
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:PURPOSE: An exhaust system for minimizing a volume of a process chamber of CVD equipment is provided to improve uniformity of a fabrication process and reduce powders stacked on an inside of an exhaust manifold by obtaining uniform exhaust pressure. CONSTITUTION: A plurality of exhaust holes(15) are formed on a bottom of a process chamber. An exhaust manifold(120) is connected to the exhaust holes and is formed with a plurality of pipe arrangements. A plurality of control valves(100) are installed between the exhaust holes and the exhaust manifolds in order to open or shut each pipe arrangement of the exhaust manifolds or control the exhaust pressure. A control unit(110) controls operations of plural control values. A confluent tube(130) is used for integrating the exhaust gases from the exhaust manifolds. A vacuum pump(140) is installed at an end of the confluent tube.
Bibliography:Application Number: KR20030035419