METHOD FOR FORMING A THIN FILM PATTERN TO REALIZE A SMALL THICKNESS OF AN LCD AND PREVENTING A DISPLAY SPOT, DEVICE COMPRISING THE THIN FILM PATTERN, A METHOD FOR MANUFACTURING THE DEVICE, AN LCD, A METHOD FOR MANUFACTURING THE LCD, AN ELECTRONIC OPTICAL APPARATUS AND AN ELECTRONIC INSTRUMENT USING THE PATTERN

• Main Authors: KIGUCHI, HIROSHI, HASEI, HIRONORI, MIKOSHIBA, TOSHIAKI, USHIYAMA, TOSHIHIRO, HIRAI, TOSHIMITSU
• Format: Patent
• Language: English; Korean
• Published: 08.12.2004
• Edition: 7
• Subjects: AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUSPOLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL; BASIC ELECTRIC ELEMENTS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; CHEMISTRY; CRYSTAL GROWTH; DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; FREQUENCY-CHANGING; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS; METALLURGY; NON-LINEAR OPTICS; OPTICAL ANALOGUE/DIGITAL CONVERTERS; OPTICAL LOGIC ELEMENTS; OPTICS; PERFORMING OPERATIONS; PHYSICS; PRINTED CIRCUITS; PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE; REFINING BY ZONE-MELTING OF MATERIAL; SEMICONDUCTOR DEVICES; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE; SINGLE-CRYSTAL-GROWTH; SPRAYING OR ATOMISING IN GENERAL; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; TRANSPORTING; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL ORUNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL

PURPOSE: A method for forming a thin film pattern, a device comprising the thin film pattern, a method for manufacturing the device, an LCD(Liquid Crystal Display), a method for manufacturing the LCD, an electronic optical apparatus and an electronic instrument using the pattern are provided to realize a small thickness of the LCD and prevent a display spot by forming the thin film pattern in the concave region of a substrate. CONSTITUTION: A concave region(32) corresponding to a prescribed thin pattern(33) is formed in a substrate(P). The concave region is formed by using a bank pattern(B) demarcating the prescribed pattern on the substrate and performing etching process using the bank pattern as a mask. Then, a solution for forming the thin film pattern(L) is putted in the concave region and the bank is removed, thereby forming the thin film pattern which is even with the substrate. This method is capable of being applied to the manufacturing of an LCD. A conductive pattern is capable of being formed in an insulating layer, thereby being even with the insulating layer.