LITHOGRAPHY PROJECTION APPARATUS HAVING COLLISION PROTECTION SYSTEM, AND PREPARATION METHOD OF DEVICE

• Main Authors: JACOBS HERNES, TERKEN MARTINUS ARNOLDUS HENRICUS, VANDERMEULEN FRITS
• Format: Patent
• Language: English; Korean
• Published: 26.11.2004
• Edition: 7
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

PURPOSE: A lithography projection apparatus and a preparation method of a device are provided, to prevent collision and to reduce the damage of components due to collision. CONSTITUTION: The lithography projection apparatus comprises a radiation system which supplies the projected beam of radiation; a supporting structure which supports a patterning device patterning the cross-section of the projected beam; a substrate table which holds a substrate; a projection system which projects the patterned beam on the target part of the substrate; and a collision protection system which can move relatively by at least one actuator system and prevents the collision between the first part and the second part of the apparatus, wherein the collision protection system comprises at least one sensor system for measuring the relative position and/or velocity of the first part and the second part of the apparatus; and a controller for controlling the actuator system to prevent the first part and the second part from moving closer when the sensor system determines that the relative position and/or velocity of the first part and the second part of the apparatus suggests the potential collision.