LITHOGRAPHY APPARATUS AND METHOD FOR FABRICATING DEVICE TO REDUCE RESIDUAL LIQUID LEFT ON SUBSTRATE AFTER EXPOSURE PROCESS IS PERFORMED BY PROJECTION SYSTEM

PURPOSE: A lithography apparatus is provided to reduce residual liquid left on a substrate after an exposure process is performed by a projection system by guaranteeing that a liquid supply system is maintained in a predetermined height. CONSTITUTION: A radiation system supplies a projection beam of...

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Main Authors BAKKER LEVINUS PIETER, STRAAIJER ALEXANDER, VANNUNEN GERARDUS PETRUS MATTHIJS, VANDERMEULEN FRITS, BASELMANS JOHANNES JACOBUS MATHEUS, HOOGENDAM CHRISTIAAN ALEXANDER, MULKENS JOHANNES CATHARINUS HUBERTUS, SLAGHEKKE BERNARDUS ANTONIUS, STREEFKERK BOB, SIMON KLAUS, MERTENS JEROEN JOHANNES SOPHIA MARIA, VANDERTOORN JAN GERARD CORNELIS, LOOPSTRA ERIK ROELOF, HOUKES MARTIJN, COX HENRIKUS HERMAN MARIE, DONDERS SJOERD NICOLAAS LAMBERTUS, DERKSEN ANTONIUS THEODORUS ANNA MARIA, LOF JOERI
Format Patent
LanguageEnglish
Korean
Published 20.11.2004
Edition7
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:PURPOSE: A lithography apparatus is provided to reduce residual liquid left on a substrate after an exposure process is performed by a projection system by guaranteeing that a liquid supply system is maintained in a predetermined height. CONSTITUTION: A radiation system supplies a projection beam of radioactive rays. A support structure supports a patterning unit functioning to pattern the projection beam according to a desired pattern. A substrate table holds a substrate. A projection system(PL) projects the patterned beam to a target of the substrate, having an optical axial line. A liquid supply system for supplying immersion liquid to the substrate is included in a space between the final element of the projection system and the substrate. At least a part of the liquid supply system freely transfers in a direction of the optical axial line and/or freely rotates with respect to at least one axial line vertical to the optical axial line.
Bibliography:Application Number: KR20040033745