LITHOGRAPHY PROJECTION APPARATUS USING CONTROLLER FOR CONTROLLING PINS HOLDING SUBSTRATE, AND PREPARATION METHOD OF DEVICE

PURPOSE: A lithography projection apparatus and a preparation method of a device are provided, to prevent the effect on a wafer and/or a wafer holder by the energy which increases when a wafer is unhold finally from a wafer holder. CONSTITUTION: The lithography projection apparatus comprises a radia...

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Bibliographic Details
Main Authors OTTENS JOOST JEROEN, ZAAL KOEN JACOBUS JOHANNES MARIA, VANEMPEL TJARKO ADRIAAN RUDOLF, VANMEER ASCHWIN LODEWIJK HENDRICUS JOHANNES, MIEDEMA JAN REIN
Format Patent
LanguageEnglish
Korean
Published 15.11.2004
Edition7
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:PURPOSE: A lithography projection apparatus and a preparation method of a device are provided, to prevent the effect on a wafer and/or a wafer holder by the energy which increases when a wafer is unhold finally from a wafer holder. CONSTITUTION: The lithography projection apparatus comprises a radiation system which supplies the projected beam of radiation; a supporting structure which supports a patterning means patterning the projected beam according to a desired pattern; a substrate holder(2) which holds a substrate(1) and has a means providing the holding force pressing the substrate to the substrate holder; a disjointing means which disjoints the substrate from the substrate holder to the holding force; a projection system which projects the patterned beam on the target part of the substrate; and a controller(5) which gives the disjointing force reduced before the final disjointing. Preferably the substrate holder has a protective rim which absorbs the abrasion energy.
Bibliography:Application Number: KR20040032232