APPARATUS FOR DRYING SEMICONDUCTOR SUBSTRATE BY INSTALLING FILTER MEMBER AT RECEIVER

PURPOSE: An apparatus for drying a semiconductor substrate is provided to prevent a leakage phenomenon due to deterioration of a receiver by installing a filter member at a receiver. CONSTITUTION: A reservoir(130) is used for storing chemicals to dry a semiconductor substrate and includes a chuck to...

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Bibliographic Details
Main Author LEE, DEOK YEOL
Format Patent
LanguageEnglish
Korean
Published 08.10.2004
Edition7
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:PURPOSE: An apparatus for drying a semiconductor substrate is provided to prevent a leakage phenomenon due to deterioration of a receiver by installing a filter member at a receiver. CONSTITUTION: A reservoir(130) is used for storing chemicals to dry a semiconductor substrate and includes a chuck to support the semiconductor substrate. A heating unit(120) is installed at nearly to a lower part of the reservoir in order to vaporize the chemicals. A receiver(140) is installed at a lower part of the chuck in order to drain the mixture of the vaporized chemicals and the residual moisture on a surface of the semiconductor substrate. A filter member(180) is installed at an upper part of the receiver in order to filter particles.
Bibliography:Application Number: KR20030019900