APPARATUS FOR SUPPLYING PHOTORESIST TO PREVENT UNDESIRED PHOTORESIST FROM BEING SUPPLIED TO PROCESS EQUIPMENT

• Main Author: RYU, HYEONG SIK
• Format: Patent
• Language: English; Korean
• Published: 30.09.2004
• Edition: 7
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

PURPOSE: An apparatus for supplying photoresist is provided to prevent undesired photoresist from being supplied to process equipment by continuously checking the name of the photoresist in a photoresist supply tank and by blocking the nitrogen supplied to the photoresist supply tank when an undesired photoresist supply tank is recognized. CONSTITUTION: At least one photoresist supply tank(100,200) supplies photoresist. A photoresist name marking part(101,201) is formed in the outer circumference of the at least one photoresist supply tank. At least one buffer tank(110,210) stores the photoresist supplied from the photoresist supply tank. A nitrogen supply pipe supplies nitrogen to the inside of the photoresist supply tank, connected to the photoresist supply tank. A nitrogen supply valve(190,290) switches on/off the flow path of the nitrogen supply pipe. A photoresist name marking sensor(180,280) recognizes the coding contents of the photoresist name marking part. A control unit(400) judges a photoresist name by using the photoresist name marking sensor and delivers a signal to automatically turn off the nitrogen supply valve when an abnormal state occurs.