METHOD FOR MANUFACTURING LITHOGRAPHIC APPARATUS AND DEVICE INCLUDING IMPROVED ALIGNMENT SYSTEM

• Main Authors: LENDERINK EGBERT, T HOOFT GERT WIM, MONSHOUWER RENE, VANDERLEE ALEXANDER MARC, HENDRIKS ROBERT FRANS MARIA
• Format: Patent
• Language: English; Korean
• Published: 20.09.2004
• Edition: 7
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

PURPOSE: Provided are method for manufacturing lithographic apparatus and device including improved alignment system, in particular one which allows for the use of smaller alignment marks. CONSTITUTION: The lithographic projection apparatus comprises a radiation system for providing a projection beam of radiation; a support structure for supporting patterning means, the patterning means serving to pattern the projection beam according to a desired pattern; a substrate table for holding a substrate; a projection system for projecting the patterned beam onto a target portion of the substrate; and an off-axis alignment system comprising a radiation source for illuminating on a substrate held on the substrate table at least one mark which is usable for alignment and an imaging system for imaging light which has interacted with the at least one mark, wherein the radiation source comprises first means for producing a ray of laser or laser-like light with a high brightness and a first wavelength spectrum which is relatively narrow and second means for guiding the ray and generating substantially within dimensions of the ray light with a second wavelength spectrum that is substantially broader than the first wavelength spectrum. In an alignment system for in an apparatus which reproducibly modifies substrates successively held on a substrate table, the system comprises a radiation source for illuminating on a substrate held on the substrate table at least one mark which is usable for alignment and an imaging system for imaging light which has interacted with the at least one mark, wherein the radiation source comprises first means for producing a ray of laser or laser-like light with a high brightness and a first wavelength spectrum which is relatively narrow and second means for guiding the ray and generating substantially within dimensions of the ray light with a second wavelength spectrum which is substantially broader than the first wavelength.