METHOD OF FORMING FILM FOR ORGANIC ELECTRIFIED LIGHT EMITTING ELEMENTS BY COMPLETING ALIGNMENT OF SUBSTRATE AND SHADOW MASK PRIOR TO MOVEMENT TO VACUUM EVAPORATION CHAMBER AND DIRECTLY TREATING SUBSTRATE THROUGH EVAPORATION PLATING PROCESS
PURPOSE: A method is provided to reduce film formation time and achieve improved productivity by completing alignment of substrate and shadow mask prior to movement to a vacuum evaporation chamber and directly treating substrate through an evaporation plating process. CONSTITUTION: A method comprise...
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Main Authors | , , , |
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Format | Patent |
Language | English Korean |
Published |
20.09.2004
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Edition | 7 |
Subjects | |
Online Access | Get full text |
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Summary: | PURPOSE: A method is provided to reduce film formation time and achieve improved productivity by completing alignment of substrate and shadow mask prior to movement to a vacuum evaporation chamber and directly treating substrate through an evaporation plating process. CONSTITUTION: A method comprises a step of aligning a substrate(41) and a shadow mask(42) outside a vacuum evaporation chamber(43); a step of moving the aligned substrate and shadow mask into the vacuum evaporation chamber through a robotic arm(44); and a step of plating an organic material obtained from an evaporating material(46) on the substrate so as to form a film for organic electrified light emitting elements. The robotic arm has an alignment mechanism(45) having a dock for retaining the substrate and the shadow mask. |
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Bibliography: | Application Number: KR20030015416 |