LITHOGRAPHIC APPARATUS HAVING RADIATION SYSTEM FOR PROVIDING A PROJECTION BEAM OF RADIATION, DEVICE MANUFACTURING METHOD, AND DEVICE MANUFACTURED THEREBY

• Main Authors: COX HENDRIKUS HERMAN MARIE, VREUGDEWATER PATRICIA, HOL SVEN ANTOIN JOHAN
• Format: Patent
• Language: English; Korean
• Published: 18.09.2004
• Edition: 7
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

PURPOSE: Provided is a Lorentz actuator having improved thermal behavior. CONSTITUTION: The lithographic projection apparatus comprises a radiation system for providing a projection beam of radiation; a support structure for supporting patterning means, the patterning means serving to pattern the projection beam according to a desired pattern; a substrate table for holding a substrate; a projection system for projecting the patterned beam onto a target portion of the substrate; and a Lorentz actuator comprising a coil arrangement (1) in thermal contact with at least one cooling element, wherein the coil arrangement comprises a plurality of coils separated from each other by one or more separation layers (6) of high thermal conductivity material arranged to be in good thermal contact with the cooling element, wherein the cooling element is a plate (2) containing cooling channels (4), whereby a coolant fluid can be circulated through the cooling channels, and wherein the separation layers contain cooling channels, whereby a coolant fluid can be circulated through the cooling channels.