SUBSTRATE TREATMENT DEVICE AND A SUBSTRATE TREATMENT METHOD TO RESTRAIN THE GENERATION OF PARTICLES
PURPOSE: A substrate treatment device and a substrate treatment method are provided to restrain the generation of particles and prevent that a supporting member such as a lift pin is transferred to a product region of a substrate. CONSTITUTION: It is prevented that a supporting pin is transferred to...
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Main Authors | , , , |
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Format | Patent |
Language | English Korean |
Published |
16.08.2004
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Edition | 7 |
Subjects | |
Online Access | Get full text |
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