SUBSTRATE TREATMENT DEVICE AND A SUBSTRATE TREATMENT METHOD TO RESTRAIN THE GENERATION OF PARTICLES

• Main Authors: TAJIRI KENICHI, SAKAI MITSUHIRO, NISHIOKA SHINJI, MURAKAMI TAKUTO
• Format: Patent
• Language: English; Korean
• Published: 16.08.2004
• Edition: 7
• Subjects: BASIC ELECTRIC ELEMENTS; DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL ANALOGUE/DIGITAL CONVERTERS; OPTICAL LOGIC ELEMENTS; OPTICS; PHYSICS; SEMICONDUCTOR DEVICES; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF

PURPOSE: A substrate treatment device and a substrate treatment method are provided to restrain the generation of particles and prevent that a supporting member such as a lift pin is transferred to a product region of a substrate. CONSTITUTION: It is prevented that a supporting pin is transferred to a product region of a substrate because air cylinders(47,49) and air cylinder(48) are converted according to the type of the substrate. The air cylinders have less driving quantity because the supporting pin is risen and driven centering around a stage(40) to restrain the generation of particles.