PATTERNABLE LOW DIELECTRIC CONSTANT MATERIAL AND ITS USE IN ULTRA-LARGE SCALE INTEGRATED INTERCONNECTION

PURPOSE: Provided are patternable low dielectric constant materials suitable for use in ultra-large scale integrated structures, and uses thereof in the ultra-large scale integrated structures. CONSTITUTION: The patternable low-k composition comprises (a) 5-100 wt.% of a polymer component, (b) a pho...

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Bibliographic Details
Main Authors LIN QINGHUANG, SOORIYAKUMARAN RATNAM
Format Patent
LanguageEnglish
Korean
Published 14.07.2004
Edition7
Subjects
ADHESIVES
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CHEMICAL PAINT OR INK REMOVERS
CHEMISTRY
CINEMATOGRAPHY
COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS
COMPOSITIONS BASED THEREON
COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
CORRECTING FLUIDS
DYES
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
FILLING PASTES
HOLOGRAPHY
INKS
MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
MATERIALS THEREFOR
METALLURGY
MISCELLANEOUS APPLICATIONS OF MATERIALS
MISCELLANEOUS COMPOSITIONS
NATURAL RESINS
ORGANIC MACROMOLECULAR COMPOUNDS
ORIGINALS THEREFOR
PAINTS
PASTES OR SOLIDS FOR COLOURING OR PRINTING
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
POLISHES
SEMICONDUCTOR DEVICES
THEIR PREPARATION OR CHEMICAL WORKING-UP
USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS
USE OF MATERIALS THEREFOR
WOODSTAINS
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Summary:PURPOSE: Provided are patternable low dielectric constant materials suitable for use in ultra-large scale integrated structures, and uses thereof in the ultra-large scale integrated structures. CONSTITUTION: The patternable low-k composition comprises (a) 5-100 wt.% of a polymer component, (b) a photosensitive acid generator, and (c) a solvent. The polymer component comprises a functionalized polymer represented by formula I having at least one acid-sensitive imageable group, wherein the polymer has a dielectric constant of less than 3.9 or can be converted to a polymer having the dielectric constant and the at least one acid-sensitive imageable functional group is selected from positive-tone functional group or negative-tone functional group.
Bibliography:Application Number: KR20030088568