PROGRAMMABLE PATTERNING MEANS AND LITHOGRAPHIC PROJECTION APPARATUS USING THE SAME

• Main Author: BLEEKER ARNO JAN
• Format: Patent
• Language: English; Korean
• Published: 05.06.2004
• Edition: 7
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; FREQUENCY-CHANGING; HOLOGRAPHY; MATERIALS THEREFOR; NON-LINEAR OPTICS; OPTICAL ANALOGUE/DIGITAL CONVERTERS; OPTICAL LOGIC ELEMENTS; OPTICS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF

PURPOSE: Provided are a programmable patterning unit with controlled an image and a lithographic projection apparatus using the unit possible to simultaneously carry out phase modulation and amplitude modulation. CONSTITUTION: The lithographic projection apparatus comprises a radiation system(Ex,IL,LA) for introducing radiation projection beam; a programmable patterning unit(PPM) for the projection beam depending on desired patterns; a mask table for fixing a substrate(W); and a projection system(PL) for projecting the patterned beam on a targeting part of the substrate. The patterning unit includes plurality of addressing possible pixels containing electrodes selectively applying power voltage to vary an electro-optical material layer and double refraction thereof.