APPARATUS GENERATING A HORIZONTAL AND VERTICAL MASK LAYOUT CONCERNING BIPOLAR LIGHT, AND A METHOD THEREFOR

PURPOSE: An apparatus generating a horizontal and vertical mask layout concerning bipolar light, and a method therefor are provided to form horizontal and vertical masks by using a bipolar light source. CONSTITUTION: A target pattern including a plurality of features having horizontal and vertical e...

Full description

Saved in:
Bibliographic Details
Main Authors EURLINGS MARKUS FRANCISCUS ANTONIUS, CHEN JANG FUNG, WAMPLER KURT E, CORCORAN NOEL, HSU DUAN FU STEPHEN
Format Patent
LanguageEnglish
Korean
Published 28.05.2004
Edition7
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
Online AccessGet full text

Cover

More Information
Summary:PURPOSE: An apparatus generating a horizontal and vertical mask layout concerning bipolar light, and a method therefor are provided to form horizontal and vertical masks by using a bipolar light source. CONSTITUTION: A target pattern including a plurality of features having horizontal and vertical edges is identified. A horizontal mask is formed based on the target pattern. A vertical mask is formed based on the target pattern. A shielding operation is performed by replacing more than one of the vertical edges of the features in the target pattern with a shield in the horizontal mask and by replacing more than one of the horizontal edges of the features in the target pattern with a shield in the vertical mask. The width of the shield is wider than the width of a corresponding feature in the target pattern.
Bibliography:Application Number: KR20030079919