LITHOGRAPHY PROJECTION APPARATUS MINIMIZING LOSS OF LIQUID FROM LIQUID SUPPLY SYSTEM AND PROCESS FOR PRODUCING DEVICE

• Main Authors: SENGERS TIMOTHEUS FRANCISCUS, STRAAIJER ALEXANDER, VANSCHAIK FRANK, RITSEMA ROELOF AEILKO SIEBRAND, MULKENS JOHANNES CATHARINUS HUBERTUS, BUTLER HANS, HOOGENDAM CHRISTIAAN ALEXANDER, STREEFKERK BOB, BIJLAART ERIK THEODORUS MARIA, SIMON KLAUS, MERTENS JEROEN JOHANNES SOPHIA MARIA, LOOPSTRA ERIK ROELOF, KOLESNYCHENKO ALEKSEY, DONDERS SJOERD NICOLAAS LAMBERTUS, LOF JOERI, DESMIT JOANNES THEODOOR, VANSANTEN HELMAR, MEIJER HENDRICUS JOHANNES MARIA
• Format: Patent
• Language: English; Korean
• Published: 27.05.2004
• Edition: 7
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

PURPOSE: A lithography projection apparatus is provided, which minimizes loss of a liquid from a liquid supply system during exposing an edge part of a substrate. And a process for producing a device is provided also. CONSTITUTION: The lithography projection apparatus comprises: a radiation system providing a radiation projection beam; a support structure supporting a patterning means patterning the projection beam according to a pattern; a substrate table(WT) holding the substrate(W); a projection system projecting the patterned beam onto a target part of the substrate(W); the liquid supply system filling at least part of space between a last element of the projection system and an object on the substrate table with the liquid(11). The substrate table(WT) contains an edge seal member(17) surrounding at least part of edge of the object, a vacuum port or a liquid supply port supplying a vacuum or the liquid to a gap between the edge seal member(17) and the object placed on the opposite side of the projection system, and a channel placed within the radius direction of the vacuum port, wherein the channel is connected to a gas source, so gas flows to the outside of the radius direction toward a vacuum source when the vacuum source operates.