NON-LITHOGRAPHIC METHOD FOR PRODUCING MASK BY SELECTIVE REACTION, ARTICLE PRODUCED THEREBY AND COMPOSITION THEREFOR

• Main Authors: SANKARAPANDIAN MUTHUMANICKAM, HEDRICK JEFFREY C, HUANG ELBERT, GATES STEPHEN M, NITTA SATYANARAYANA V, PURUSHOTHAMAN SAMPATH, COLBURN MATTHEW E
• Format: Patent
• Language: English; Korean
• Published: 12.05.2004
• Edition: 7
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; PRINTED CIRCUITS; SEMICONDUCTOR DEVICES

PURPOSE: Provided are a method of producing a mask by forming fine patterns on a substrate used in microelectronics industry accurately and inexpensively without utilizing lithography, an article produced thereby and a composition therefor. CONSTITUTION: The structured article having a self aligned pattern on an existing pattern of a substrate is formed by the method comprising applying a coating of the masking material on a top surface of the substrate; and attaching at least a portion of the masking material onto portions of the existing pattern preferentially to the top surface. The method is carried out using a composition for selectively coating such pattern on a substrate, which comprises a carrier material for applying onto a substrate and a polymer in the carrier that is reactively grafted into regions of the substrate having first chemical characteristics.