ANTIFOAMING AND DISPERSION AGENT WITH EXCELLENT ANTIFOAMING PROPERTY AND DISPERSION OF SCUM GENERATED IN PHOTORESIST DEVELOPER

• Main Authors: HOSAKA MASAKI, KAWAMATA HIROMASA
• Format: Patent
• Language: English; Korean
• Published: 08.05.2004
• Edition: 7
• Subjects: ADHESIVES; APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMISTRY; CINEMATOGRAPHY; DYES; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE; MATERIALS THEREFOR; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; ORIGINALS THEREFOR; PAINTS; PERFORMING OPERATIONS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL; PHYSICS; POLISHES; SEPARATION; TRANSPORTING

PURPOSE: Provided are an antifoaming and dispersion agent with excellent antifoaming property and dispersion of scum generated in a photoresist developer and a development process of the photoresist. CONSTITUTION: The antifoaming and dispersion agent comprises fatty acid mixture consisting of high fatty acid having 15 or more carbon atoms and middle fatty acid having 6-14 carbon atoms in relative ratio of 5 to 300 mass parts; and partial fatty acid ester from reaction of aliphatic tertiary alcohols. The partial fatty acid ester includes 5 to 1,500 mass parts of diester based to 100 mass parts of monoester. The agent is employed in the production of alkali resist developers. The antifoaming and dispersion agent is effective to prevent scum generated in the developer from attaching or forming scale on the resist or substrate coated by the resist.