LITHOGRAPHY TOOL HAVING VACUUM RETICLE LIBRARY COUPLED TO VACUUM CHAMBER

• Main Authors: PUERTO SANTIAGO DEL, EURLINGS MARKUS F. A
• Format: Patent
• Language: English; Korean
• Published: 27.03.2004
• Edition: 7
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

PURPOSE: Provided is a lithographic tool or method which increases multiple exposure throughput under an ultra violet environment by switching multiple reticles during exposure at a high speed. CONSTITUTION: The lithographic method comprises: a step(504) of processing reticles received from a vacuum...