LITHOGRAPHY TOOL HAVING VACUUM RETICLE LIBRARY COUPLED TO VACUUM CHAMBER

PURPOSE: Provided is a lithographic tool or method which increases multiple exposure throughput under an ultra violet environment by switching multiple reticles during exposure at a high speed. CONSTITUTION: The lithographic method comprises: a step(504) of processing reticles received from a vacuum...

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Bibliographic Details
Main Authors PUERTO SANTIAGO DEL, EURLINGS MARKUS F. A
Format Patent
LanguageEnglish
Korean
Published 27.03.2004
Edition7
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:PURPOSE: Provided is a lithographic tool or method which increases multiple exposure throughput under an ultra violet environment by switching multiple reticles during exposure at a high speed. CONSTITUTION: The lithographic method comprises: a step(504) of processing reticles received from a vacuum input section in a vacuum processing section; a step(506) of storing the reticles in a vacuum library; a step(508) of indexing the stored reticles; and a step(510) of recovering a reticle requested to be used for exposing a pattern on a wafer from the vacuum library, based on the indexing step. The lithographic method may further comprise the step of transferring the reticles from atmospheric pressure to vacuum in the input section.
Bibliography:Application Number: KR20030051942