Modified chitosan and artificial dermis using the same

PURPOSE: A modified chitosan dermal structure, its preparation method and an artificial dermis containing the modified chitosan dermal structure are provided, to improve the cell tropism (biocompatibility). CONSTITUTION: The modified chitosan dermal structure is prepared by heating a first dermal st...

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Main Authors LIM, SE HWAN, KIM, TAE HWAN, PARK, HYEON SUK, KIM, CHEON HO, SON, YEONG SUK, JIN, YONG JAE
Format Patent
LanguageEnglish
Korean
Published 06.03.2004
Edition7
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Summary:PURPOSE: A modified chitosan dermal structure, its preparation method and an artificial dermis containing the modified chitosan dermal structure are provided, to improve the cell tropism (biocompatibility). CONSTITUTION: The modified chitosan dermal structure is prepared by heating a first dermal structure containing chitosan at a temperature of 60-130 deg.C for 1-72 hours. Preferably the heating is performed in vacuum or under reduced pressure; and the amine group of chitosan of the first dermal structure comprises the quaternary ammonium salt of an organic acid. Preferably the first dermal structure is a sponge-type, nonwoven-type or porous spherical chitosan dermal structure, a sponge-type chitosan or collagen-mixed dermal structure, or a collagen-coated sponge-type chitosan dermal structure. 본 발명은 변형 키토산 진피 구조물의 제조방법에 관한 것으로, 구체적으로는 키토산을 포함하는 1차 진피 구조물을 60∼130℃에서 1∼72시간 동안 가열하는 단계를 포함하는 변형 키토산 진피 구조물의 제조방법에 관한 것이다. 본 발명의 방법에 따르면, 세포 친화성이 높은 변형 키토산 진피 구조물을 제공할 수 있다.
Bibliography:Application Number: KR20020050521