LITHOGRAPHY APPARATUS AND PREPARATION METHOD OF DEVICE

• Main Author: DIERICHS MARCEL MATHIJS THEODORE MARIE
• Format: Patent
• Language: English; Korean
• Published: 07.01.2004
• Edition: 7
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

PURPOSE: A lithography projection apparatus and a method for preparing a device are provided, to allow the lighting settings to be controlled more effectively in a lighting system using a mirror. CONSTITUTION: The lithography projection apparatus comprises a radiation system(Ex) which comprises a reflection optical element containing a first facet mirror supplying a radiation projected beam(PB) and generating a plurality of source images on a second facet mirror; a support structure which supports a patterning means patterning the projected beam according to a certain pattern; a substrate table holding a substrate; and a projection system which projects the patterned beam on the target area of the substrate. A face masking means(MA) comprises at least one partially untransparent masking blade which selectively masks at least one face of one of the first and second facet mirrors and optionally is disposed in the projection beam, and the masking blade has a large pitch sufficient for generating ignorable diffraction and has regularly arranged untransparent region and transparent region covering the total facet.