SPIN SCRUBBER

PURPOSE: A spin scrubber is provided to be capable of preventing the front surface of the second wafer from being contaminated due to a brush used for cleaning the rear surface of the first wafer. CONSTITUTION: A spin scrubber(100) is provided with a process chamber(110), a turntable installed at th...

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Bibliographic Details
Main Authors SHIN, MYEONG HWAN, HWANG, GYEONG SEOK
Format Patent
LanguageEnglish
Korean
Published 11.12.2003
Edition7
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:PURPOSE: A spin scrubber is provided to be capable of preventing the front surface of the second wafer from being contaminated due to a brush used for cleaning the rear surface of the first wafer. CONSTITUTION: A spin scrubber(100) is provided with a process chamber(110), a turntable installed at the inner portion of the process chamber for fixing a semiconductor wafer, and a jet nozzle(150) for jetting the deionized water supplied from a deionized water supply source onto the semiconductor wafer. The spin scrubber further includes the first brush unit(130) for brushing the first surface of the semiconductor wafer and the second brush unit(140) for brushing the second surface of the semiconductor wafer. At this time, the first and second brush unit include a brush and an arm, respectively. 본 발명은 순수(Deionizedwater) 및 브러쉬(Brush)를 이용하여 웨이퍼를 세정하는 스핀 스크러버에 관한 것으로, 본 발명의 스핀 스크러버는 상기 처리조 내에 설치되고 반도체 웨이퍼가 고정되는 턴테이블과; 순수공급원에서 공급되는 순수를 웨이퍼 상에 분사하는 분사노즐과; 브러쉬와 아암을 갖고 상기 턴테이블에 놓여진 반도체 웨이퍼의 표면을 닦아내기 위한 제1브러쉬 유닛과; 브러쉬와 아암을 갖고 상기 턴테이블에 놓여진 경면 반전된 반도체 웨이퍼의 윗면을 닦아내기 위한 제2브러쉬 유닛을 포함한다.
Bibliography:Application Number: KR20020031642