PHOTO-RESIST COMPOSITION

PURPOSE: Provided is a photoresist composition, which can improve the interfacial contact with a substrate and has excellent sensitivity, resolution, chemical resistance and heat resistance. CONSTITUTION: The photoresist composition comprises a resist solution consisting of novolac resin which is an...

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Bibliographic Details
Main Authors SUNG, SI JIN, KIM, SANG TAE, SONG, HYEONG SU, PARK, JONG WON, KANG, SEUNG JIN
Format Patent
LanguageEnglish
Korean
Published 10.10.2003
Edition7
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:PURPOSE: Provided is a photoresist composition, which can improve the interfacial contact with a substrate and has excellent sensitivity, resolution, chemical resistance and heat resistance. CONSTITUTION: The photoresist composition comprises a resist solution consisting of novolac resin which is an alkali soluble resin, a photosensitizer and a solvent, and further comprises 0.001 wt% to 8.0 wt% of a benzoic acid-based compound of the formula 1 based on 100 wt% of the resist solution. In the formula 1, R is hydrogen atom or a C1-C8 alkyl group. In particular, the photosensitizer is an ortho-naphthoquinone diazide compound. 본 발명은 포토레지스트와 기판과의 계면 밀착성을 개량하고, 에칭공정 처리에 있어서의 문제점을 개선함과 동시에, 감도, 해상성, 내열성에 우수한 포토레지스트 조성물을 제공하는 것으로, g-line, i-line 포토레지스트, 액정표시소자용 레지스트 등의 조성물에 하기 화학식 1의 벤조산계 화합물을 첨가시킴으로써 레지스트와 기판사이의 밀착성을 개선시키고, 또한 고감도화, 내열성, 내화학성 등을 향상시킨다. (식중, R 은 수소 원자, 또는 C~ C인 알킬기를 나타냄)
Bibliography:Application Number: KR20020018615