THICK FILM PHOTORESIST LAYER LAMINATE METHOD OF MANUFACTURING THICK FILM RESIST PATTERN AND METHOD OF MANUFACTURING CONNECTING TERMINAL

• Main Authors: SAITO KOJI, WASHIO YASUSHI, OKUI TOSHIKI
• Format: Patent
• Language: English; Korean
• Published: 27.06.2003
• Edition: 7
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; PRINTED CIRCUITS; SEMICONDUCTOR DEVICES

PURPOSE: To provide a means by which a resist composition can sensitively react to form a high precision resist pattern in a thick-film photoresist layer used in manufacture of connection terminal and so on. CONSTITUTION: The resist pattern is formed by using the thick-film photoresist layer laminate which features that a substrate (a) and the thick-film photoresist layer (b) containing the resin whose alkali solubility is changed by the action of acid and an acid generating agent are laminated via a shielding layer (c) obstructing the contact between the substrate (a) and the thick-film photoresist layer (b), and the connection terminal is formed by using the same. 접속단자 등의 제조에 사용되는 후막 포토레지스트층에 있어서, 레지스트 조성물이 고감도로 반응하여, 고정밀도의 레지스트 패턴을 형성할 수 있는 수단이 제공된다. (a) 지지체와, (b) 알칼리 용해성이 산의 작용에 의해 변화되는 수지 및 산발생제를 함유하는 후막 포토레지스트층이, 이 (a) 지지체와 이 (b) 후막 포토레지스트층의 접촉을 방해하는 (c) 차폐층을 통해 적층되어 있는 후막 포토레지스트층 적층체를 사용하여 레지스트 패턴을 형성하고, 이것을 사용하여 접속단자를 형성한다.