Coating compositions for use with an overcoated photoresist

PURPOSE: Provided is a coating composition comprising a polyester resin component to prevent spin-on reflection which can be used with an overcoated photoresist to prepare a direct circuit board. CONSTITUTION: The coating composition includes an anti-reflection composition containing a polyester res...

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Main Authors WAYTON GERALD B, COLEY SUZANNE, TREFONAS III. PETER
Format Patent
LanguageEnglish
Korean
Published 25.06.2003
Edition7
Subjects
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Abstract PURPOSE: Provided is a coating composition comprising a polyester resin component to prevent spin-on reflection which can be used with an overcoated photoresist to prepare a direct circuit board. CONSTITUTION: The coating composition includes an anti-reflection composition containing a polyester resin and a photoresist layer on the anti-reflection composition. The polyester resin includes an aromatic group as a pendant group or as a backbone unit. The aromatic group is, for example, a carbocyclic aryl group, such as substituted or non-substituted phenyl, substituted or non-substituted naphtyl or substituted or non-substituted anthracene. The anti-reflection composition includes a substance having a substituted or non-substituted aryl dicarboxylate group, a substituted or non-substituted carbocyclic aryl dicarboxylate group, substituted or non-substituted phenyl dicarboxylate group, or substituted or non-substituted phenyl dicarboxylate group. 제 1 측면으로, 폴리에스테르 수지 성분을 함유하는 유기 코팅 조성물, 특히 스핀 상태의(spin-on) 반사방지 코팅 조성물이 제공된다. 다른 측면으로, 다중 하이드록시 화합물을 중합하여 수득된 수지 성분을 함유하는 코팅 조성물이 제공된다. 본 발명의 코팅 조성물은 직접회로판을 제조하기 위해 오버코팅된 포토레지스트 층과 함께 특히 유용하게 사용된다.
AbstractList PURPOSE: Provided is a coating composition comprising a polyester resin component to prevent spin-on reflection which can be used with an overcoated photoresist to prepare a direct circuit board. CONSTITUTION: The coating composition includes an anti-reflection composition containing a polyester resin and a photoresist layer on the anti-reflection composition. The polyester resin includes an aromatic group as a pendant group or as a backbone unit. The aromatic group is, for example, a carbocyclic aryl group, such as substituted or non-substituted phenyl, substituted or non-substituted naphtyl or substituted or non-substituted anthracene. The anti-reflection composition includes a substance having a substituted or non-substituted aryl dicarboxylate group, a substituted or non-substituted carbocyclic aryl dicarboxylate group, substituted or non-substituted phenyl dicarboxylate group, or substituted or non-substituted phenyl dicarboxylate group. 제 1 측면으로, 폴리에스테르 수지 성분을 함유하는 유기 코팅 조성물, 특히 스핀 상태의(spin-on) 반사방지 코팅 조성물이 제공된다. 다른 측면으로, 다중 하이드록시 화합물을 중합하여 수득된 수지 성분을 함유하는 코팅 조성물이 제공된다. 본 발명의 코팅 조성물은 직접회로판을 제조하기 위해 오버코팅된 포토레지스트 층과 함께 특히 유용하게 사용된다.
Author COLEY SUZANNE
WAYTON GERALD B
TREFONAS III. PETER
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DocumentTitleAlternate 오버코팅된 포토레지스트와 함께 사용하기 위한 코팅 조성물
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Snippet PURPOSE: Provided is a coating composition comprising a polyester resin component to prevent spin-on reflection which can be used with an overcoated...
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SubjectTerms APPARATUS SPECIALLY ADAPTED THEREFOR
AUXILIARY PROCESSES IN PHOTOGRAPHY
BASIC ELECTRIC ELEMENTS
CHEMISTRY
CINEMATOGRAPHY
COMPOSITIONS BASED THEREON
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
LAYERED PRODUCTS
LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
MATERIALS THEREFOR
METALLURGY
ORGANIC MACROMOLECULAR COMPOUNDS
ORIGINALS THEREFOR
PERFORMING OPERATIONS
PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES
PHYSICS
SEMICONDUCTOR DEVICES
THEIR PREPARATION OR CHEMICAL WORKING-UP
TRANSPORTING
Title Coating compositions for use with an overcoated photoresist
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