Coating compositions for use with an overcoated photoresist

PURPOSE: Provided is a coating composition comprising a polyester resin component to prevent spin-on reflection which can be used with an overcoated photoresist to prepare a direct circuit board. CONSTITUTION: The coating composition includes an anti-reflection composition containing a polyester res...

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Bibliographic Details
Main Authors WAYTON GERALD B, COLEY SUZANNE, TREFONAS III. PETER
Format Patent
LanguageEnglish
Korean
Published 25.06.2003
Edition7
Subjects
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Summary:PURPOSE: Provided is a coating composition comprising a polyester resin component to prevent spin-on reflection which can be used with an overcoated photoresist to prepare a direct circuit board. CONSTITUTION: The coating composition includes an anti-reflection composition containing a polyester resin and a photoresist layer on the anti-reflection composition. The polyester resin includes an aromatic group as a pendant group or as a backbone unit. The aromatic group is, for example, a carbocyclic aryl group, such as substituted or non-substituted phenyl, substituted or non-substituted naphtyl or substituted or non-substituted anthracene. The anti-reflection composition includes a substance having a substituted or non-substituted aryl dicarboxylate group, a substituted or non-substituted carbocyclic aryl dicarboxylate group, substituted or non-substituted phenyl dicarboxylate group, or substituted or non-substituted phenyl dicarboxylate group. 제 1 측면으로, 폴리에스테르 수지 성분을 함유하는 유기 코팅 조성물, 특히 스핀 상태의(spin-on) 반사방지 코팅 조성물이 제공된다. 다른 측면으로, 다중 하이드록시 화합물을 중합하여 수득된 수지 성분을 함유하는 코팅 조성물이 제공된다. 본 발명의 코팅 조성물은 직접회로판을 제조하기 위해 오버코팅된 포토레지스트 층과 함께 특히 유용하게 사용된다.
Bibliography:Application Number: KR20020058334