Semiconductor film semiconductor device and method of manufacturing the same

• Main Authors: MATSUO TAKUYA, NOMURA KATSUMI, SHIGA AIKO, MIYAIRI HIDEKAZU, MAKITA NAOKI
• Format: Patent
• Language: English; Korean
• Published: 18.04.2003
• Edition: 7
• Subjects: BASIC ELECTRIC ELEMENTS; DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL ANALOGUE/DIGITAL CONVERTERS; OPTICAL LOGIC ELEMENTS; OPTICS; PHYSICS; SEMICONDUCTOR DEVICES; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF

PURPOSE: To provide a semiconductor film manufacturing method of improving a semiconductor film having a crystal structure in film properties by improving a technique indicated in the publication number No.8-78329, a TFT which uses the above semiconductor film as an active layer and is superior in T...