SUBSTRATE PROCESSING APPARATUS
PURPOSE: To provide a substrate treatment apparatus and a substrate treatment process which dissolve clogging of foreign body in a line or the like, and prolong the lifetime or a filter. CONSTITUTION: A substrate treating device is provided with a substrate treatment part for treating a substrate wi...
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Main Authors | , , |
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Format | Patent |
Language | English Korean |
Published |
26.02.2003
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Edition | 7 |
Subjects | |
Online Access | Get full text |
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Summary: | PURPOSE: To provide a substrate treatment apparatus and a substrate treatment process which dissolve clogging of foreign body in a line or the like, and prolong the lifetime or a filter. CONSTITUTION: A substrate treating device is provided with a substrate treatment part for treating a substrate with a treatment agent and a treatment agent recovering route 137 for passing the treating agent exhausted from the substrate treatment part. The treatment agent recovering route 137 is provided with foreign body removal lines 181, 182 which comprise filters 200, 210 for removing foreign bodies mixed with the treatment agent and cleaning means 201, 211 for cleaning the filters 200, 210.
본 발명은, 기판처리장치에 관한 것으로, 처리액에 의해 기판을 처리하는 기판처리부(46)와, 이 기판처리부에서 배출한 처리액을 통과시키는 처리액회수로(137)를 설치한 기판처리장치에서, 처리액회수로(137)에 처리액으로 혼합된 이물을 제거하는 필터(200, 210)와 필터(200, 210)을 세정하는 세정수단(201, 211)을 구비한 이물제거라인(181, 182)을 설치하고, 배관 등의 이물이 막히는 것을 해소하며 필터의 수명을 연장하는 기술을 제공한다. |
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Bibliography: | Application Number: KR20020049080 |