ILLUMINATION SYSTEM PROJECTION EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD

PURPOSE: An illumination system is provided in which an illuminating region is illuminated with uniform illuminance, and the center of gravity of the light intensity of light beams incident on the illuminating region coincides with a center of the light beams. CONSTITUTION: The illumination system c...

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Bibliographic Details
Main Author TSUJI TOSHIHIKO
Format Patent
LanguageEnglish
Korean
Published 05.02.2003
Edition7
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:PURPOSE: An illumination system is provided in which an illuminating region is illuminated with uniform illuminance, and the center of gravity of the light intensity of light beams incident on the illuminating region coincides with a center of the light beams. CONSTITUTION: The illumination system comprises the first reflection type integrator, the first condensing mirror system for superposing light beams from the first reflection type integrator one upon another on the surface to be illuminated, the second reflection type integrator disposed between the light source and the first reflection type integrator, and the second condensing mirror system for superposing light beams from the second reflection type integrator one upon another on the first reflection type integrator. 본 발명은, 균일한 조도로 조명영역을 조명하는 조명계로서, 조명영역위에 충돌하는 광의 광강도무게중심은 광선의 중심과 일치하는 것을 특징으로 하는 조명계를 개시한다. 조명계는, 제 1반사형 인티그레이터와, 제 1반사형 인티그레이터로부터의 광속을 피조명면위에 서로 중첩하는 제 1집광미러계와, 광원과 제 1반사형 인티그레이터사이에 배치된 제 2반사형 인티그레이터와, 제 2반사형 인티그레이터로부터의 광속이 제 1반사형 인티그레이터위에 서로 중첩하는 제 2집광미러계와를 포함한다. 또한, 본 발명은 이러한 조명계를 가진 노광장치와, 그를 이용하는 디바이스의 제조방법을 개시한다.
Bibliography:Application Number: KR20020044348