METHOD FOR MANUFACTURING ARRAY SUBSTRATE AND PHOTOMASK

PURPOSE: A method for fabricating an array substrate is provided to fabricate an active layer capable of forming a plurality of thin film transistors(TFT's) that have high mobility of carriers and a uniform capacity while not limiting the design in a TFT fabrication process and not performing a...

Full description

Saved in:
Bibliographic Details
Main Authors SHIMOTO SHIGEYUKI, UCHIKOGA SHUICHI
Format Patent
LanguageEnglish
Korean
Published 05.02.2003
Edition7
Subjects
Online AccessGet full text

Cover

Loading…
More Information
Summary:PURPOSE: A method for fabricating an array substrate is provided to fabricate an active layer capable of forming a plurality of thin film transistors(TFT's) that have high mobility of carriers and a uniform capacity while not limiting the design in a TFT fabrication process and not performing an additional process. CONSTITUTION: An amorphous material is deposited on a transparent substrate and is changed to a polycrystalline material by irradiation of energy beams through a photomask such that the mask includes a transparent region permitting the energy beams to pass through and a shutoff region surrounding the transparent region and interrupting the energy beams. The transparent region is defined by the first and second lengthwise direction lines extending substantially in parallel to each other. The first and second slanting direction lines extend from opposed ends of the lengthwise direction lines after declining by angles larger than 90 degrees to join with each other. The third and fourth slanting region lines extend from the other opposed ends of the lengthwise direction lines after declining by angles larger than 90 degrees to join with each other, the transparent region having a length in the extending direction of the first and second lengthwise direction lines, which is longer than the length of the transparent region in the direction perpendicular to the extending direction of the first and second lengthwise direction lines. 본 발명은, TFT 제조공정에서의 설계를 제약하는 일없이, 또한 추가공정을 부가하는 일없이 캐리어 이동도가 높고 일정한 성능을 갖는 복수의 TFT의 활성층을 형성하기 위한 어레이기판을 제조하는 방법 및 포토마스크를 제공한다. 본 발명에 따른 어레이기판을 제조하는 방법에 이용되는 포토마스크는, 비정질재료를 다결정재료로 변질시키는 에너지선을 투과시키고, 서로 거의 평행하게 연신(延伸)하는 길이방향(긴 쪽 방향)선(330) 및 길이방향선(335)과, 길이방향선 각각의 일단에 있어서 길이방향선이 서로 마주 보는 방향으로 90도보다 큰 각도로 굴절하도록 각각 연결되어 있고, 길이방향선보다도 짧은 경사방향선(340) 및 경사방향선(345)과, 길이방향선 각각의 타단에 있어서 길이방향선이 서로 마주 보는 방향으로 90도보다 큰 각도로 굴절하도록 각각 연결되어 있으며, 보다 짧은 경사방향선 (350) 및 경사방향선(355)에 의해 둘러싸인 투과영역(310) 및, 투과영역의 주위에 있어서 에너지선을 차단시키는 차단영역을 갖춘다.
Bibliography:Application Number: KR20020044200