AN APPARATUS FOR CONTINUOUS PLASMA POLYMERIZING WITH A VERTICAL CHAMBER

• Main Authors: CHO, SEOK JE, JUNG, YEONG MAN, YOON, DONG SIK, HA, SAM CHEOL
• Format: Patent
• Language: English; Korean
• Published: 29.11.2002
• Edition: 7
• Subjects: APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL; BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRICITY; INFORMATION STORAGE; INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; PERFORMING OPERATIONS; PHYSICS; PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL; SPRAYING OR ATOMISING IN GENERAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; TRANSPORTING

PURPOSE: A continuous plasma polymerization equipment with one or more vertical chambers is provided in which a surface treated substrate is vertically moved in the chambers. CONSTITUTION: In a continuous plasma polymerization equipment with a plurality of chambers in which the surface of a substrate moved into the chambers is treated by plasma polymerization, the continuous plasma polymerization equipment with vertical chambers comprises at least one or more vertical chambers in which a substrate is vertically moved, and which comprises at least one or more electrodes, wherein the vertical chambers comprise a chamber main body in which the substrate is vertically moved, and one side surface of which is opened, a chamber door that is coupled to the opened surface of the chamber main body, and at least one or more electrodes that are arranged with being parallel to a moving direction of the substrate. The continuous plasma polymerization equipment with vertical chambers comprises first vertical chamber(20a) in which a substrate(24) is vertically moved, and which comprises at least one or more electrodes; and second vertical chamber(20b) in which the substrate(24) is vertically moved, and which comprises at least one or more electrodes and is arranged with spaced apart from the first vertical chamber in a certain distance. The continuous plasma polymerization equipment with vertical chambers comprises an unwinding chamber equipped with an unwinding roll(25); a winding chamber equipped with a winding roll(26); first polymerization chamber on upper one side and lower one side of which substrate penetration holes(22a,22b) are formed, and in which at least one or more electrodes are installed; and second polymerization chamber on upper one side and lower one side of which substrate penetration holes(22a,22b) are formed, and in which at least one or more electrodes are installed, wherein the substrate is moved oppositely in the first and second polymerization chambers respectively. 본 발명은 수직챔버를 구비한 플라즈마중합 연속처리장치에 관한 것으로서, 다수의 챔버를 구비하며, 챔버내부로 이동하는 기재의 표면에 플라즈마 중합에 의한 표면처리를 수행하는 플라즈마중합 연속처리장치에 있어서, 챔버 내에서 기재의 이동 방향이 수직이며 적어도 하나 이상의 전극을 포함하는 수직챔버를 적어도 하나 이상 포함하여 구성되는 수직챔버를 구비한 플라즈마중합연속처리장치를 제공한다.