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Summary:PURPOSE: A deposition apparatus for continuous polymerization system using plasma in a vertical chamber of which gas flows smoothly, and which prevents a material transferred from being damaged is provided. CONSTITUTION: The deposition apparatus for continuous polymerization system using plasma comprises a process chamber(2') that is vertically arranged; a plural electrodes(11) that are arranged in a row at both sides of a supply line through which a sheet shaped material(1) continuously supplied into the process chamber passes; exhaust pipes(12,12') for exhausting an internal air of the process chamber(2'); slits(13) for isolating the process chamber as well as the outside and guiding flow of gas into the exhaust pipes(12,12'); and insulating members(20) that are coupled to the end part of the slits(13) respectively to cut off contact of the material with the slits, wherein the insulating members(20) are made of Teflon, and round parts are formed at the end part of the insulating members to prevent damage of the material during contact of the material.
Bibliography:Application Number: KR20010025491