ORGANIC/INORGANIC COMPLEX MATERIAL COATING COMPOSITION AND PREPARATION METHOD OF OVERCOAT LAYER OF LIQUID CRYSTAL DISPLAY DEVICE

• Main Authors: HWANG, YUN IL, KIM, GWANG GYU, KIM, GYEONG JUN, AHN, YONG SIK, KIM, HYO SEOK
• Format: Patent
• Language: English; Korean
• Published: 07.11.2002
• Edition: 7
• Subjects: ADHESIVES; CHEMICAL PAINT OR INK REMOVERS; CHEMISTRY; COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS; CORRECTING FLUIDS; DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING; DYES; FILLING PASTES; FREQUENCY-CHANGING; INKS; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; NON-LINEAR OPTICS; OPTICAL ANALOGUE/DIGITAL CONVERTERS; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICAL LOGIC ELEMENTS; OPTICS; PAINTS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; PHYSICS; POLISHES; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; USE OF MATERIALS THEREFOR; WOODSTAINS

PURPOSE: An organic/inorganic complex material coating composition, the overcoat layer of a color filter and the passivation of a TFT (thin film transistor) containing the composition, its preparation method and a liquid crystal display device containing the overcoat layer or the passivation are provided to improve the coating property and the adhesive power. CONSTITUTION: The organic/inorganic complex material coating composition comprises a homopolymer represented by the formula 1, or a polymer resin matrix containing of the homopolymer of the formula 1 and the copolymer of the formula 2 or 3; a metal compound selected from the group consisting of metal alkoxides, metal alkoxide sol, metal oxide and metal oxide sol; and a solvent. In the formula 1, R is a substituted or unsubstituted alkylene group of C1-C8; R1 is H or CH3; R2 is methyl group, ethyl group, propyl group, butyl group or methylene group; M is a metal selected from the group consisting of Si, Ti, Al, Zr and Ba; and m is an integer of 5-10. In the formulas 2 and 3, R3 is H or CH3; and R4 is benzyl group, an alkyl group of C1-C8, an aryl group having a substituent of C1-C6 or a benzyl group substituted with a halogen atom.