LEVELLING APPARATUS OF DEVICE EXPOSURING OF WAFER

PURPOSE: A leveling apparatus of a wafer exposing equipment is provided to prevent defocus phenomenon and exposing failure of edge portions of a wafer by densely forming channels in a scanning field. CONSTITUTION: A plurality of channels(42) formed in a scanning field(41) are achieved leveling data...

Full description

Saved in:
Bibliographic Details
Main Authors NAM, YONG U, JUNG, JAE GWAN
Format Patent
LanguageEnglish
Korean
Published 19.10.2002
Edition7
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
Online AccessGet full text

Cover

More Information
Summary:PURPOSE: A leveling apparatus of a wafer exposing equipment is provided to prevent defocus phenomenon and exposing failure of edge portions of a wafer by densely forming channels in a scanning field. CONSTITUTION: A plurality of channels(42) formed in a scanning field(41) are achieved leveling data by reflecting beams of an emitting part to a receiving part in a projection lens. At this time, the channels(42) are densely formed in the scanning field(41) in accordance with the scanning direction, so that exact leveling data are determined in the edge portions of the wafer. 본 발명은 웨이퍼 에지 영역의 디포커스(Defocus) 현상 및 노광 불량을 방지하는데 적당한 웨이퍼 노광 장비의 레벨링 장치에 관한 것으로, 프로젝션 렌즈 일측에 설치된 발광부의 빔을 타측의 수광부로 반사하여 레벨링 데이터를 제공하는 스캐닝 필드내 복수개의 채널에 있어서, 웨이퍼 에지 영역의 칩에서 레벨링 데이터를 얻기 위하여 스캐닝 방향에 따라 스캐닝 필드 내에 채널을 조밀하게 형성하고 레벨링 계측 경로수를 추가하여 계측하도록 한다.
Bibliography:Application Number: KR20010017634