APPARATUS FOR IMPLANTING FLUID

PURPOSE: An apparatus for implanting fluid is provided to obtain easily uniformity of fluid implanted on a substrate and change easily a direction of the fluid implanted to the substrate to clean and dry the substrate and minimize noise generated from the implantation process by using two tubes. CON...

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Bibliographic Details
Main Authors YE, DONG SEON, LEE, JUN GYU
Format Patent
LanguageEnglish
Korean
Published 11.10.2002
Edition7
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:PURPOSE: An apparatus for implanting fluid is provided to obtain easily uniformity of fluid implanted on a substrate and change easily a direction of the fluid implanted to the substrate to clean and dry the substrate and minimize noise generated from the implantation process by using two tubes. CONSTITUTION: The first and the second tube(40,50) have a rectangular section, respectively. The rectangular section of the second tube(50) is smaller than the rectangular section of the first tube(40). The second tube(50) is inserted into the first tube(40). The first tube(40) has the first implantation hole(42) for draining fluid. The second tube(50) has the second and the third implantation hole for draining the fluid. The second and the third implantation hole are formed on a surface of the second tube(50) which is not contacted with the first tube(40). A control portion(60) includes the first control portion(61) for reducing a width of the first implantation hole(42) and the second control portion(62) for expanding the width of the first implantation hole(42). The second control portion(62) is formed with a bolt(62a) and a nut(62b).
Bibliography:Application Number: KR20010017118