APPARATUS FOR EVALUATING POLYSILICON FILM

• Main Authors: EBE MASATAKA, ABE TETSUO, NOGUCHI YOSHIYUKI, OOSHIMA AKIFUMI, ISHIGURO TOMOHIRO, ISOMURA EIJI, KATO YASUYUKI, TATSUKI KOICHI, TAMAKI HIROYUKI, HATTORI TADASHI, WADA HIROYUKI, URAGAKI MAKOTO, UMEZU NOBUHIKO
• Format: Patent
• Language: English; Korean
• Published: 26.07.2002
• Edition: 7
• Subjects: BASIC ELECTRIC ELEMENTS; DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; FREQUENCY-CHANGING; INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES; MEASURING; NON-LINEAR OPTICS; OPTICAL ANALOGUE/DIGITAL CONVERTERS; OPTICAL LOGIC ELEMENTS; OPTICS; PHYSICS; SEMICONDUCTOR DEVICES; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; TESTING

PURPOSE: An apparatus for evaluating a polysilicon film is provided to enable objective automatic evaluation of the status of a polysilicon film by using a contact-free fashion with accuracy. CONSTITUTION: A substrate(W) in which the polysilicon film is formed is mounted on a stage(25). An optical system for observation with the visible light illuminates the visible light on the substrate on the stage to photograph a surface image of the polysilicon film on the substrate and effect auto-focusing. An optical system for observation with ultraviolet(UV) light illuminates UV light on the substrate on the stage to acquire an auto-focused surface image of the polysilicon film of the substrate while using the optical system for observation with the visible light. An evaluating unit for evaluating the linearity and periodicity of a spatial structure of the film surface of the polysilicon film, from a surface image of the polysilicon film obtained by the optical system for observation with UV light, evaluates the status of the polysilicon film based on the results of evaluation of the linearity and periodicity. 형성된 폴리실리콘막의 상태를 객관적으로, 비접촉으로, 정밀도 양호하게 자동적으로 평가할 수 있는 폴리실리콘막 평가 장치를 제공한다. 그러므로, 폴리실리콘막이 형성된 기판(W)이 탑재되는 스테이지(25), 가시광을 스테이지 상의 기판(W)에 조사(照射)함으로써 기판(W) 상의 폴리실리콘막의 표면 화상을 촬상(撮像)하여 오토포커스하는 가시광 관찰 광학계(4, 8, 12, 40a), 자외광을 스테이지 상의 기판에 조사함으로써, 상기 가시광 관찰 광학계를 사용하여 오토포커스된 기판의 폴리실리콘막의 표면 화상을 얻는 자외광 관찰 광학계(6, 10, 40b), 및 자외광 관찰 광학계에 의해 얻어진 폴리실리콘막의 표면 화상으로부터 폴리실리콘막의 막 표면의 공간 구조의 직선성 및 주기성을 평가하고, 이 직선성 및 주기성의 평가 결과에 따라, 상기 폴리실리콘막의 상태를 평가하는 평가 수단(51)을 포함하는 폴리실리콘막 평가 장치를 제공한다.