APPARATUS FOR LOADING RETICLE OF EXPOSURE SYSTEM FOR FABRICATING SEMICONDUCTOR

PURPOSE: An apparatus for loading a reticle of an exposure system for fabricating a semiconductor is provided to effectively prevent contamination of the crystal back surface of the reticle even when the reticle is stored in a reticle cassette for a long interval of time, by improving the structure...

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Bibliographic Details
Main Author JUNG, JAE GWAN
Format Patent
LanguageEnglish
Korean
Published 26.06.2002
Edition7
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:PURPOSE: An apparatus for loading a reticle of an exposure system for fabricating a semiconductor is provided to effectively prevent contamination of the crystal back surface of the reticle even when the reticle is stored in a reticle cassette for a long interval of time, by improving the structure of a reticle loading apparatus of a stepper for exposure. CONSTITUTION: The first arm(2) is installed on a main frame(1), capable of rotating with respect to a Z-axis and moving up and down along a Z-axis direction. The second arm(3) is installed at the end of the first arm, capable of rotating with respect to a Z-axis. A reticle receiver(4) has a finger(5) on which the reticle is settled. A reticle receiver rotating unit rotates the reticle receiver with respect to an X-axis or Y-axis.
Bibliography:Application Number: KR20000079115