Black matrix and process for preparing thereof

• Main Authors: LEE, JUN BAE, PARK, CHANG WON, SONG, MI RAN
• Format: Patent
• Language: English; Korean
• Published: 20.06.2002
• Edition: 7
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRICITY

PURPOSE: A black matrix and a method for fabricating the same are provided to improve a contrast characteristic and a luminance characteristic by using Cro and Cr. CONSTITUTION: A pixel of a display device is surrounded by a black matrix as a black coating layer. The black coating layer includes a dielectric material such as CrO and Cr. The thickness of the CrO is 0.05 to 0.1 micro meter. The thickness of the Cr is 0.1 to 0.2 micro meter. The black matrix is formed by depositing sequentially CrO and Cr. In the method for fabricating the black matrix, the CrO and the Cr of the predetermined thickness are deposited on a panel. A photo-resist is coated thereon. A photo-resist pattern is formed by performing an exposure process and a developing process. A CrO/Cr pattern is formed by processing selectively the Cr layer. A cleaning process is performed. A striping process is performed by using an organic solvent. 본 발명의 블랙매트릭스는 글래스 패널의 내면에 대하여 CrO 및 Cr을 순차적으로 증착하여 얻어진다. 상기 블랙매트릭스가 형성된 패널은, 우선 패널 상에 소정의 두께로 CrO 및 Cr을 순차적으로 증착하고, 그 위에 감광재인 포토레지스트를 코팅한 후, 마스크 노광, 현상하여 포토레지스트 패턴을 형성한 뒤, 상기 포토레지스트 패턴이 제거된 부분의 하단에 제조된 크롬막을 에천트로 처리하여 CrO/Cr의 패턴을 형성한다. 이어서 정제수로 세척하고, 패턴 상부에 위치한 포토레지스트를 유기용제로 스트리핑함으로써 얻을 수 있다.